| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Editor: Phillip D. Blais |
| Title | Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicron Lithographies II: March 14-15, 1983, Santa Clara, California |
| Publisher | SPIE - The International Society for Optical Engineering |
| Year | 1983 |
| Languages | eng |
| Isbn | 0892524286 |
| Series | SPIE Proceedings |
| Volume | 393 |
| Description | viii, 242 p. 28 cm. |
| Record date | 20130826 |
| Location | Bellingham, Wash. |