| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Elizabeth A. Dobisz |
| Title | Emerging Lithographic Technologies IV: 28 February-1 March 2000, Santa Clara, USA |
| Publisher | SPIE Optical Engineering Press |
| Year | 2000 |
| Languages | eng |
| Isbn | 0819436151 |
| Series | SPIE Proceedings |
| Volume | 3997 |
| Description | 900 s. |
| Record date | 20090807 |
| Location | Bellingham, Wash., USA |