| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Uwe F. W. Behringer |
| Title | EMLC 2005: 21st European Mask and Lithography Conference: 31 January-3 February 2005, Dresden, Germany |
| Publisher | SPIE Optical Engineering Press |
| Year | 2005 |
| Languages | eng |
| Isbn | 0819458309 |
| Series | SPIE Proceedings |
| Volume | 5835 |
| Description | xxx, 302 p. ill. 28 cm. |
| Record date | 20090902 |
| Location | Bellingham, Wash., USA |
| Keywords | Integrated circuits, Microlithography |
| Urlnote | Table of contents only |
| Urls | http://www.loc.gov/catdir/toc/fy0607/2006273846.html |