| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Editors: Richard L. Ruddell, Dino Ciarlo, J. Dey, K. Hoeppner |
| Title | Developments in Semiconductor Microlithography III: April 10-11, 1978, San Jose, California |
| Publisher | SPIE - The International Society for Optical Engineering |
| Year | 1978 |
| Languages | eng |
| Isbn | 082521627 |
| Series | SPIE Proceedings |
| Volume | 135 |
| Description | vi, 170 p. 28 cm. |
| Record date | 20130824 |
| Location | Bellingham, Wash. |