Shelfclass_id | S/SPIE |
Sortkey | S/SPIE |
Authors | Editors: Richard L. Ruddell, Dino Ciarlo, J. Dey, K. Hoeppner |
Title | Developments in Semiconductor Microlithography III: April 10-11, 1978, San Jose, California |
Publisher | SPIE - The International Society for Optical Engineering |
Year | 1978 |
Languages | eng |
Isbn | 082521627 |
Series | SPIE Proceedings |
Volume | 135 |
Description | vi, 170 p. 28 cm. |
Record date | 20130824 |
Location | Bellingham, Wash. |