| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Theodore H. Fedynyshyn |
| Title | Advances in Resist Technology and Processing XX: Part 1/2: 24-26 February 2003, Santa Clara, California, USA |
| Publisher | Spie |
| Year | 2003 |
| Languages | eng |
| Isbn | 0819448443 |
| Series | SPIE Proceedings |
| Volume | 5039:1/2 |
| Description | 2 v. ill. 28 cm. |
| Record date | 20090821 |
| Location | Bellingham, Wash. |
| Keywords | Photoresists, Microlithography |