| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Harry L. Stover |
| Title | Optical Microlithography III: Technology for the Next Decade: March 14-15, 1984, Santa Clara, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1984 |
| Languages | eng |
| Isbn | 0892525053 |
| Series | SPIE Proceedings |
| Volume | 470 |
| Issn | 99-0108644 |
| Description | 269 s. diagr., ill., tab. |
| Record date | 20100805 |
| Location | Bellingham, Wash. |