| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Thomas Kwok, Takamaro Kikkawa, Krishna Shenai |
| Title | Submicrometer Metallization: The Challenges, Opportunities and Limitations: 23-25 September 1992, San Jose, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1993 |
| Languages | eng |
| Isbn | 0819410039 |
| Series | SPIE Proceedings |
| Volume | 1805 |
| Description | 344 s. |
| Record date | 20090722 |
| Location | Bellingham, Wash., USA |
| Keywords | Electromigration, Mikrostruktur (Materiallära), Microstructure (Engineering materials), Tunna skikt (Mikroelektronik), Thin films (Microelectronics), Metallisering (Halvledarteknik), Metallization (Semiconductor engineering), Konferenspublikationer, Conference proceedings |