| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Masanori Komuro |
| Title | Photomask and Next-Generation Lithography Mask Technology XII: Part 2/2: 13-15 April 2005, Yokohama, Japan |
| Publisher | Spie |
| Year | 2005 |
| Languages | eng |
| Isbn | 0819458538 |
| Series | SPIE Proceedings |
| Volume | 5853:2/2 |
| Description | 2 v. (xli, 1048 p.) ill. 28 cm. |
| Record date | 20090902 |
| Location | Bellingham, Wash. |
| Keywords | Masks (Electronics), Integrated circuits, X-ray lithography, Microlithography, Optoelectronic devices |
| Notes | Some earlier proceedings have title: Photomask and X-ray mask technology. |