| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | David O. Patterson |
| Title | Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III: 1-2 March 1993, San Jose, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1993 |
| Languages | eng |
| Isbn | 0819411582 |
| Series | SPIE Proceedings |
| Volume | 1924 |
| Description | 470 s. |
| Record date | 20090827 |
| Location | Bellingham, Wash., USA |
| Keywords | Electron-beam lithography, X-ray lithography, Mikrolitografi, Microlithography, Konferenspublikationer, Conference proceedings |