| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Martin Peckerar |
| Title | Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II: 8-9 March 1992, San Jose, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1992 |
| Languages | eng |
| Isbn | 0819408263 |
| Series | SPIE Proceedings |
| Volume | 1671 |
| Description | 488 s. |
| Record date | 20090827 |
| Location | Bellingham, Wash., USA |
| Keywords | Mikrolitografi, Microlithography, Konferenspublikationer, Conference proceedings |