| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Douglas J. Resnick |
| Title | Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX: 7-8 March 1990, San Jose, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1990 |
| Languages | eng |
| Isbn | 0819403105 |
| Series | SPIE Proceedings |
| Volume | 1263 |
| Issn | 99-0108644 |
| Description | 344 s. |
| Record date | 20100809 |
| Location | Bellingham, Wash., USA |
| Keywords | Mikrolitografi, Microlithography, Konferenspublikationer, Conference proceedings |