| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Martin Peckerar |
| Title | Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing: 6-7 March 1991, San Jose, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1991 |
| Languages | eng |
| Isbn | 0819405647 |
| Series | SPIE Proceedings |
| Volume | 1465 |
| Description | x, 340 s. |
| Record date | 20090721 |
| Location | Bellingham, Wash., USA |
| Keywords | Mikrolitografi, Microlithography, Konferenspublikationer, Conference proceedings |