Shelfclass_id | S/SPIE |
Sortkey | S/SPIE |
Authors | Hideo Yoshihara |
Title | Photomask and X-Ray Mask Technology II: 20-21 April 1995, Kawasaki City, Kanagawa, Japan |
Publisher | SPIE Optical Engineering Press |
Year | 1995 |
Languages | eng |
Isbn | 0819418706 |
Series | SPIE Proceedings |
Volume | 2512 |
Issn | 99-0108644 |
Description | 554 s. |
Record date | 20100813 |
Location | Bellingham, Wash., USA |
Keywords | Phase-shift masks, Photomask technology, Lithography, Metrology, Mikrolitografi, Microlitography, Tryckta kretsar, Printed circuits, Konferenspublikationer, Conference proceedings |