| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Hideo Yoshihara |
| Title | Photomask and X-Ray Mask Technology II: 20-21 April 1995, Kawasaki City, Kanagawa, Japan |
| Publisher | SPIE Optical Engineering Press |
| Year | 1995 |
| Languages | eng |
| Isbn | 0819418706 |
| Series | SPIE Proceedings |
| Volume | 2512 |
| Issn | 99-0108644 |
| Description | 554 s. |
| Record date | 20100813 |
| Location | Bellingham, Wash., USA |
| Keywords | Phase-shift masks, Photomask technology, Lithography, Metrology, Mikrolitografi, Microlitography, Tryckta kretsar, Printed circuits, Konferenspublikationer, Conference proceedings |