| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | John L. Sturtevant |
| Title | Advances in Resist Technology and Processing XXI: Part 2/2: 23-24 February 2004, Santa Clara, California, USA |
| Publisher | Spie |
| Year | 2004 |
| Languages | eng |
| Isbn | 0819452890 |
| Series | SPIE Proceedings |
| Volume | 5376:2/2 |
| Description | 2 v. (xxxviii, 1288 p.) ill. 28 cm. |
| Record date | 20090821 |
| Location | Bellingham, Wash., USA |
| Keywords | Photoresists, Microlithography |