| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Francis M. Houlihan |
| Title | Advances in Resist Technology and Processing XVIII: Part 2/2: 26-28 February 2001, Santa Clara, USA |
| Publisher | Spie |
| Year | 2001 |
| Languages | eng |
| Isbn | 0819440310 |
| Series | SPIE Proceedings |
| Volume | 4345:2/2 |
| Description | 2 v. (xxix, 1084 p.) ill. 28 cm. |
| Record date | 20090820 |
| Location | Bellingham, Washington |
| Keywords | Photoresists, Microlithography |