Shelfclass_id | S/SPIE |
Sortkey | S/SPIE |
Authors | William D. Hinsberg |
Title | Advances in Resist Technology and Processing X: 1-2 March 1993, San Jose, California |
Publisher | SPIE Optical Engineering Press |
Year | 1993 |
Languages | eng |
Isbn | 0819408271 |
Series | SPIE Proceedings |
Volume | 1925 |
Issn | 99-0108644 |
Description | 738 s. |
Record date | 20100813 |
Location | Bellingham, Wash., USA |
Keywords | Resist technology, Microlithography, Chemically amplified resists, Dissolution inhibition, Dry-developed resists, Tryckta kretsar, Printed circuits, Konferenspublikationer, Conference proceedings |