Shelfclass_id |
S/SPIE |
Sortkey |
S/SPIE |
Authors |
William L. Brodsky, Gilbert V. Shelden |
Title |
14th Annual Symposium on Photomask Technology and Management: 14-16 September 1994, Santa Clara, California |
Publisher |
SPIE Optical Engineering Press |
Year |
1994 |
Languages |
eng |
Isbn |
0819416533 |
Series |
SPIE Proceedings |
Volume |
2322 |
Issn |
99-0108644 |
Description |
454 s. |
Record date |
20100813 |
Location |
Bellingham, Wash., USA |
Keywords |
Microlithography, Printed circuits, Tillverkning av integrerade kretsar, Manufacture of integrated circuits, Konferenspublikationer, Conference proceedings |
Notes |
BACUS |