| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | William L. Brodsky, Gilbert V. Shelden |
| Title | 14th Annual Symposium on Photomask Technology and Management: 14-16 September 1994, Santa Clara, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1994 |
| Languages | eng |
| Isbn | 0819416533 |
| Series | SPIE Proceedings |
| Volume | 2322 |
| Issn | 99-0108644 |
| Description | 454 s. |
| Record date | 20100813 |
| Location | Bellingham, Wash., USA |
| Keywords | Microlithography, Printed circuits, Tillverkning av integrerade kretsar, Manufacture of integrated circuits, Konferenspublikationer, Conference proceedings |
| Notes | BACUS |