| Shelfclass_id | S/SPIE |
| Sortkey | S/SPIE |
| Authors | Scott Landstrom, Richard LaFrance |
| Title | 12th Annual Symposium on Photomask Technology and Management: 23-24 September 1992, Sunnyvale, California |
| Publisher | SPIE Optical Engineering Press |
| Year | 1993 |
| Languages | eng |
| Isbn | 0819410098 |
| Series | SPIE Proceedings |
| Volume | 1809 |
| Description | 286 s. |
| Record date | 20090827 |
| Location | Bellingham, Wash., USA |
| Keywords | Lithography, Photomask technology, Metrology, Phase-shifting masks, Microlithography, Tillverkning av integrerade kretsar, Manufacture of integrated circuits, Konferenspublikationer, Conference proceedings |