| Shelfclass_id | 7.A |
| Sortkey | DEFOREST, WILLIAM S |
| Authors | William S. DeForest |
| Title | Photoresist: Materials and Processes |
| Publisher | McGraw-Hill Book Company |
| Year | [1975] |
| Languages | eng |
| Isbn | 0070162301 |
| Description | xi, 269 p. ill. 24 cm. |
| Record date | 20090909 |
| Location | New York |
| Keywords | Photoresists, Integrated circuits, Printed circuits |