| Shelfclass_id | 6.B |
| Sortkey | DAMMEL, RALPH |
| Authors | Ralph Dammel |
| Title | Diazonaphthoquinone-Based Resists |
| Publisher | SPIE Optical Engineering Press |
| Year | c1993 |
| Languages | eng |
| Isbn | 0819410195 |
| Series | Tutorial texts in optical engineering |
| Volume | 11 |
| Description | 203 p. ill. 26 cm |
| Record date | 20060809 |
| Location | Bellingham, Wash., USA |
| Keywords | Photoresists, Masks (Electronics) |